Dual-Source Vacuum Evaporation PVD System Machine For Metal, OLEDs, Organic

Lith-QH-ZD02-High-Vacuum Multi-Material Evaporation

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Technical Specifications

Key Features

1. High-Precision Deposition Control

· Automated Rate/Power/Temperature Control: Ensures repeatable thin-film growth for research and small-scale production.

· Real-Time Thickness Monitoring (4× Probes): Enables accurate multilayer deposition with ±5% uniformity.

· Dual-Source Configuration (4 Metal + 4 Organic): Supports co-evaporation for advanced materials like perovskites and organic semiconductors.

2. Optimized for Efficiency & Stability

· Fast Pump-Down (<30 min to 5×10⁻⁴ Pa): Reduces downtime between batches, improving lab productivity.

· Low Leak Rate (6.7×10⁻⁸ Pa·L/S): Maintains ultra-high vacuum integrity for sensitive processes.

· Long-Term Pressure Holding (≤2 Pa after 12 hours): Minimizes re-pumping time for multi-step experiments.

3. User-Friendly Design

· Side-Loading & Front-Opening Chamber: Compatible with glovebox workflows, reducing contamination risks.

· Water-Cooled Sample Rotation (0–30 RPM): Enhances film homogeneity while preventing thermal damage.

· Optional Mask Storage: Enables patterned deposition for micro/nanofabrication.

4. Robust Safety Protections

· Anti-Implosion Design: Safeguards against chamber breaches during high-vacuum operation.

· Auto Gas Refill & Environmental Thermocouple: Protects samples and equipment during reactive material handling.

Application Areas

1. Advanced Optoelectronic Research

· OLEDs & Organic Electronics: Precise co-evaporation of metal-organic layers for emissive devices.

· Perovskite Solar Cells: Uniform thin-film deposition for high-efficiency photovoltaic research.

· Quantum Dots & 2D Materials: Controlled growth of nanoscale films for photonics and sensors.

2. Industrial Thin-Film Development

· Barrier Coatings: Ultra-thin encapsulation layers for flexible electronics.

· MEMS & Sensors: High-purity metal/oxide deposition for microfabrication.

· Optical Coatings: Low-defect films for lenses, mirrors, and filters.

3. Customizable for Specialized Needs

· In-Situ Monitoring Upgrades: Additional diagnostics (e.g., RHEED, quartz crystal microbalance) available.

· Multi-Source Expansion: Accommodates complex material stacks (e.g., ternary systems).

Why Choose This System?

✔ Lab-Optimized Throughput: Balances high sample capacity (16×25 mm substrates) with research-grade precision.
✔ Glovebox-Compatible: Ideal for air-sensitive materials like lithium or reactive organics.
✔ Future-Ready Design: Modular options support evolving thin-film R&D demands.