Benchtop Multi-Layer Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film
Lith-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films
Product Overview
The Lith-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training.
Key Features & Advantages
1. Wide Application Range
· Materials Research: Metal films, dielectric layers, polymer coatings.
· Functional Devices: Thin-film sensors, optical coatings, nanoelectronics.
· Multi-Layer Deposition: Supports up to 99 layers in a single run.
2. User-Friendly Operation
· Plug-and-play design—no specialized lab environment required.
· 10-inch touchscreen for intuitive control and process monitoring.
· Preloaded 100+ deposition recipes for quick setup.
3. High Precision & Stability
· Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity).
· Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum.
· 3 independent evaporation sources prevent material cross-contamination.
4. Flexible Configuration
· Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage.
· Automatic & manual modes for customized process control.
5. Low Maintenance & Compact Design
· Aluminum chamber for efficient heat dissipation.
· 65 kg weight, suitable for benchtop use in labs or offices.
Technical Specifications
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Parameter
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Specification
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Chamber
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Ø300 × 350(h) mm (quartz glass)
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Vacuum System
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300L/s turbomolecular pump + dual-stage rotary pump
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Ultimate Vacuum
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≤6 × 10⁻⁵ Pa (after baking)
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Leak Rate
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≤5.0 × 10⁻⁹ Pa·L/s
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Deposition Rate
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≥10 nm/min (material-dependent)
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Film Uniformity
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≤3% (with rotation)
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Evaporation Sources
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3 independent thermal sources
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Max Layers per Run
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99 layers (up to 4 materials)
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Control Interface
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10" touchscreen with programmable recipes
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Power Supply
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AC 230V, 32A, 50Hz
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Cooling Water (Optional)
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0.2 MPa, 15–25°C, ≥8 L/min
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Operational Workflow
1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation.
2. Multi-Layer Control: Supports time-based or thickness-based deposition modes.
3. Remote Monitoring: Adjust parameters via network connection.
Why Choose ?
✔ Combines research-grade performance with desktop convenience.
✔ Minimal training required—ideal for multi-user environments.
✔ Scalable for both experimental and small production needs.