SEM Low-Temperature Mini Conductive Magnetron Sputtering System

Glovebox-Compatible SEM Sample Coater for Beam-Sensitive Materials

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1. System Overview

✔ Non-conductive sample coating (Au/Ag/Pt) for SEM imaging
✔ Temperature-sensitive substrates (<60°C process temp)
✔ High-quality thin film deposition with minimized thermal damage
2.  Core parameter

Parameter	Specification
Ultimate Vacuum	4×10⁻² mbar
Base Vacuum	1 Pa
Pump Down Time	<1 minute
Vacuum Pump	Rotary Vane (2 L/s, Oil-lubricated)
Vacuum Measurement	Mechanical Gauge (Atmosphere-10⁻² mbar)

3. Cold Sputtering Technology: Patented magnetic confinement reduces substrate heating

4. Glovebox-Adaptable: Optional configuration for inert atmosphere processing

Parameter	Specification
Model	Lith-BY-JS08
Sputtering Type	DC Magnetron (Physical Vapor Deposition)
Target Materials (Standard)	Au (50mmØ×0.1mm)
Optional Target Materials	Ag, Pt, Cr
Maximum Substrate Size	Ø70mm (customizable)
Chamber Material	Borosilicate Glass (160mmØ×120mmH)
System Dimensions (W×D×H)	300×360×380 mm
Weight	28 kg