High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

Tel：+86 13003860308
Whatsapp: +86 13003860308
Wechat：18659217588

Item No.:

Lith-BY-JS12

Payment:

L/C D/A D/P T/T Western Union

Shipping port:

Xiamen Port

Lead Time:

5 days

High Vacuum RF+DC Magnetron Ion Sputtering Coater Coating Machine

Parameter	Specification
Vacuum Pump System	Rotary Vane Pump (Oil-lubricated) + Oil-Free Turbo Molecular Pump Set
Rotary Pump Speed	50Hz: 16m³/h (4.4 L/s) \| 60Hz: 19.2m³/h (5.2 L/s)
Molecular Pump Speed	300 L/s
Ultimate Vacuum	5 × 10⁻⁴ Pa
Working Pressure	0.5 – 5 Pa
Pump-Down Time	>10 min (to 10 Pa)
Vacuum Measurement	Range: Atmosphere to 10⁻⁴ Pa
Gas Control	Mass Flow Controller (MFC)
Chamber Size	φ260mm × 200mm (Metal Chamber)
Magnetron Target Source	Target Size: φ50mm × 3mm (Copper) Compatible with Weakly Magnetic Materials
Operation Method	Manual Control (Instruction Manual Provided)
Weight / Dimensions	100kg / 610mm (L) × 420mm (W) × 490mm (H)
Power Supply	AC 110V 60Hz or AC 220V 50Hz
Power Consumption	<3000W
Cooling System	Air Cooling (Pump) + Water Cooling (Sputtering Target)
Warranty	1-Year Limited Warranty with Lifetime Technical Support

Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings.

2. High Vacuum Stability

Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films.

3. Flexible Compatibility

·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples.

·φ50mm target supports copper and weakly magnetic materials for diverse applications.

4. Efficient Cooling System

·Water-cooled target minimizes thermal load during high-power sputtering.

· Air-cooled pump reduces maintenance costs for continuous operation.

·Research Fields
Thin film deposition, nanostructured coatings, semiconductor device development.

·Industrial Uses
Optical coatings, wear-resistant layers, surface modification of electronic components.

RF Sputter Coater

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Magnetron Sputtering Coater