High-Vacuum Multi-target Magnetron Sputtering Coating System For Multilayer Thin Film Fabrication

Model: Lith-TK-JS01-Multilayer Thin Film Fabrication

Technical Parameters

Parameter	Specification
Model	TK-JS01
Vacuum Chamber Structure	Vertical top-opening design, manual gas spring lift
Chamber Dimensions	Φ220mm × H300mm
Heating Temperature	Room temperature to 500°C
Substrate Holder Size	Φ100mm (rotatable, heated)
Film Uniformity	≤ ±5.0% within Φ50mm area
Sputtering Target	1 × Φ2-inch magnetron target (DC/RF compatible)
Process Gas Control	1–2 channels, precision ±0.1 sccm
Control System	PLC + touchscreen interface
Footprint (Main Unit)	600mm (L) × 800mm (W) × 1700mm (H)
Power Consumption	≥6 kW
Base Vacuum	6.6×10⁻⁵Pa
Pumping Time	≤15 min (from atmosphere to 7×10⁻³Pa)

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Applications

Designed for thin-film research and small-batch production, ideal for:

· Academic labs: Universities and research institutes studying novel materials.

· Industrial R&D: Prototyping functional coatings (e.g., ITO for solar cells, wear-resistant alloys).

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Key Features

1. Multi-Mode Sputtering

·Supports DC, RF, and pulsed sputtering for metals, oxides, and semiconductors.

·Single-/multi-target configurations for layered or composite films.

2. User-Friendly Operation

·Automated PLC control with real-time monitoring via touchscreen.

·Substrate heating (≤300°C) and rotation (2–20 rpm) for uniform coatings.

3. Compact & Reliable

·Minimal footprint, low maintenance, and energy-efficient design.

4. Safety & Precision

·Water-cooling protection, gas flow control (±0.1 sccm), and arc suppression.

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Quick Start Guide

1. Installation:

·Ensure stable power (AC 380V ±5%, ≥8 kW), cooling water (≥10 L/min), and proper grounding (<3Ω).

·Verify vacuum seals and gas connections before startup.

2. Operational Workflow:

·Pumping: Start mechanical pump → Open foreline valve → Activate molecular pump (at >5 Pa).

·Deposition: Set substrate temperature → Adjust gas flow → Initiate sputtering (5–15 W/cm² target power).

·Shutdown: Cool substrate (<50°C) → Vent chamber → Maintain pump oil/clean seals regularly.

3. Maintenance Tips:

·Replace mechanical pump oil every 500 operational hours.

·Clean chamber and target surfaces after each use to avoid cross-contamination.

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Summary

This combines research-grade precision with industrial durability, offering:

· Flexibility: Adaptable to diverse materials (metals, dielectrics, etc.).

· Efficiency: Fast pumping, intuitive controls, and low running costs.

· Support: Comprehensive manuals and technical assistance provided.

For advanced applications (e.g., perovskite layers), consult the manufacturer for tailored process parameters.