High-Precision Multi-Target Magnetron Sputter Coating System Coater

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Product Details

High-Precision Multi-Target Magnetron Sputter Coating System Coater

Model: Lith-PC-JS11 – Product Specifications

Specifications

Category	Parameter	Details
Vacuum Performance	Ultimate Vacuum (Sputtering Chamber)	≤6.6×10⁻⁶ Pa
	System Leak Rate	≤5.0×10⁻⁷ Pa·L/S
	Pump-Down Time (Atmosphere → 6.6×10⁻⁴ Pa)	≤30 min
	Vacuum Retention (After 12 Hours Shutdown)	≤5 Pa
Sputtering Chamber	Structure	Vertical, top-opening, stainless steel (argon-welded, electropolished)
	Dimensions	≥Ø300 mm × 300 mm (with anti-contamination liner)
	Bakeability & Sealing	100–150°C; metal gasket/fluororubber O-ring
Magnetron Sputtering	Target Configuration	3 × 50 mm adjustable-angle permanent magnet targets (RF/DC/MF compatible)
	Power Supply	2 × DC (≥500 W), 1 × auto-matching RF (≥500 W)
	Film Uniformity	≤5% deviation
	Additional Features	3 × SMC rotary shutters; magnetic material support
Substrate Stage	Sample Capacity	1 × ≥100 mm diameter
	Rotation Speed	0–30 RPM (adjustable)
	Heating Range	RT–500°C (PID-controlled, thermocouple feedback)
Gas Delivery	Mass Flow Control	2 paths (100 SCCM + 20 SCCM MFCs, CF16 valves)
	Auxiliary Gas Lines	2 × DN16 inlet valves
Pumping System	High-Vacuum Pump	Pfeiffer Hipace 700 (680 L/s) + 4 L/s rotary pump
	Valves & Pipeline	DN40/CC150 pneumatic valves, stainless steel bellows
Control & Safety	Automation	PLC + industrial PC + touchscreen (real-time monitoring/logging)
	Protection	Interlocks for water/power faults (overcurrent, open circuit, etc.)
Additional Components	Frame	Steel construction, lockable casters, removable panels
	Included Accessories	Chiller, silent compressor, tool kit, spare parts
Measurement	Vacuum Gauge	INFICON combination gauge