Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Model: Lith-JY-JS02-Cold Magnetron Sputtering Deposition System

Product Description

The Lith-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications.

Key Features

· "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples.

· Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples.

· Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling.

· Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure.

· Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement.

Technical Specifications

Sputtering System

Parameter	Specification
Target Material	Standard: Pt (57mm diameter × 0.1mm thickness) <br> Optional: Au, Au/Pd, Pt/Pd
Sample Stage Rotation	0–60 rpm (continuously adjustable)
Sample Stage Tilt	-45° to +45° (continuously adjustable)
Stage Diameter	40mm (holds 4 standard sample holders; custom sizes available)
Sputtering Current	Microprocessor-controlled (0–99 mA) with safety interlock
Vacuum Range	Atm ~3 Pa
Control Method	Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting

Vacuum Pump

Parameter	Specification
Pumping Speed	133 L/min
Ultimate Vacuum	0.05 Pa
Noise Level	56 dB

Applications & Advantages

· Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials.

· Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research.

· User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility.

· Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.